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Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond

Cover image: Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond 9789811500459
  • Author(s)
    Guilei Wang
  • Publisher
    Springer
  • Format
    Reflowable
  • Print ISBN 9789811500459, 9811500452
  • eText ISBN 9789811500466, 9811500460
  • Copyright
    2019
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$53.99 NZD
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Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond is written by Guilei Wang and published by Springer. The Digital and eTextbook ISBNs for Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond are 9789811500466, 9811500460 and the print ISBNs are 9789811500459, 9811500452. Save up to 80% versus print by going digital with VitalSource.

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